I am Guojin Chen, currently a Ph.D. student 🚀 at The Chinese University of Hong Kong (CUHK-CSE) under the guidance of Professor Bei Yu. My current research is focused on computational lithography and mask optimization. Additionally, my research interests include (1) machine learning in VLSI design for manufacturability and (2) physics-informed networks for solving EDA area problems. I am seeking academic visit or research intern opportunities.
I'm also maintaining a curated list of AI for EDA papers. Check it out here: Awesome AI for EDA. The list is under construction and you are welcomed to submit your publications follow the instructions.
Talking about Personal Stuffs: